Technique of light-assisted polishing of quartz surface

27.06.2023

Technique of light-assisted polishing of quartz surface covered with sodium hypochlorite solution

The modern high-tech development is inseparably linked with the development of nanotechnology. The use of nanostructured materials opens up new perspectives and opportunities in various scientific and technological fields. To create a variety of nanostructures with specified parameters, quartz substrates are widely used and the requirements for their surface quality are constantly growing. Today's technologies define the sub-nanometer flatness tolerance of the substrate surface shape. Another important surface parameter is the level of surface roughness, which should also be less than 1 nm. In this regard, the search for new efficient methods for processing quartz surfaces continues, among which the noncontact method of etching using the local near field stands out. The technical solution we proposed makes it possible to improve this method of nanolocal etching.
The solution is based on the fact that the surface of quartz immersed in a solution containing molecular chlorine is illuminated from the side of the quartz substrate at a critical angle of total internal reflection. This makes it possible to obtain an enhanced evanescent electric field directly above the surface protrusions. An increased electric field leads to the photodissociation of chlorine molecules, followed by local chemical interaction of the formed chlorine ions with the quartz surface in the region of protrusions.

Contacts:

Serhii Kolienov, serhii.kolienov@knu.ua
Vasyl Kanevskii, vikanev@ukr.net

Selected publicatiuons:

  • Vasyl Kanevskii, Serhii Kolienov, Valerii Grygoruk, Oleksandr Stelmakh, and Hao Zhang Profile evolution during photochemical nano-polishing of a rough quartz surface under direct illumination // Applied Optics, Vol. 61, Issue 17, pp. 5128-5135 (2022)
  • Vasyl Kanevskii, Serhii Kolienov, Valerii Grygoruk, etc. The enhanced technique for photochemical nano-polishing of a rough quartz surface: the numerical calculation of profile evolution // Applied Optics, Vol. 62 (8), pp. 2109-2116 (2023).
  • Спосіб нанолокального щавлення шорсткої поверхні кварцу // Патент на корисну
    модель №152588 МПК Н01L 21/302, чинний з 16.03.2023, бюл. №11.
Technique of light-assisted polishing of quartz surface